MICROSCOPY WORKSHOP IN POLAND DRAWS INTERNATIONAL AUDIENCE
10-11th July 2001
Wroclaw, Poland -- The International Workshop on Scanning Probe Microscopy in Nanotechnology at the Institute of Microsystem Technology in the Wroclaw University of Technology, featured eleven distinguished nanoscientists from Germany, Switzerland and Poland. Co-sponsored by the university and Triple-O Microscopy GmbH of Potsdam, Germany, the July 10-11 workshop was attended by nearly one hundred delegates from Europe, China, Japan, and the United States.
The two-day program opened with Prof. Dr. H. Fuchs of the University of Muenster and a 20 year review of the rapid advances in scanning since 1981.

Focusing on high tech crystals, Prof. Dr. M. Szymonski of Jagiellonian University, Krakow, showed vivid scans of high resolution SPM studies of ionic films epitaxially grown on Class III-V semiconductors.

Prof. Dr. H. Fuchs, Munester
Mr. J. Seidel (left) from the University of Technology, Dresden, reported on the manipulation of white-light illumination in near-field imaging and spectroscopy.

Dr. D. Pohl (right) of the University of Basel presented highly refined SNOM techniques, incorporating dipole antennae, aperture variants and electrolytic processes, to achieve new levels of speed, power and sensitivity in near-field optics.
Mr. J. Seidel , Dresden Dr. D. Pohl, Basel,
Prof. Dr. Ania Sankowska enjoys Coffee Break with Guests
The University of Wuppertal's, Dr. R. Heiderhoff, addressed SPM/SEM hybrid systems, cathodoluminescence, tip-induced nanoscopic electron beam induced current analysis, and increasing investigative functions and flexibility at the nanoscale.

Nanoscale domain engineering with ferroelectronics films was explored by Prof. Dr. L Eng of the Institute of Applied Physics, University of Technology, Dresden, with domain switching, domain wall structure, erosion, 3D polarization, voltage modulation and other key elements in ferroelectronic development on surfaces.
Dr. R. Heiderhoff, Wuppertal
From the Federal Institute for Material Research and Testing, Berlin, Dr.H. Sturm examined nanolithography as a vital tool for structuring and analyzing polymer surfaces, showed striking visuals of "flowers" produced in Dynamic Plowing Lithography and discussed DPL vs. FDI Force Distance Indentation.
Prof. Dr. L. Eng, Dresden
Dr. H. Danzebrink, PTB Physics and Technical Institute of Braunschweig, spoke on active and passive silicon probes for scanning near-field optical microscopy and SPM-based nanometrology, challenges in advanced SI technology, EU transfer standards for SPM, and new developments in focused ion beams, coated/uncoated silicon probes, and low temperature SNOM.
Dr. H. Sturm, BAM Berlin Dr. H. Danzebrink, PTB Braunschweig
Dr. Z. Rymuza (l), and Dr. P. Grabiec, both from Warsaw
Prof. Dr. Herrmann, PTB Braunschweig
Dr. P. Grabiec, Institute for Electron Technology, Warsaw, covered the broad array of studies and interdisciplinary applications of microprobe and nanoprobe technological issues undertaken in his laboratory, including silicon research and development, sensors, tips, MRI issues, cantilevers, and thin films.

Prof. Dr. Z. Rymuza of the University of Technology, Warsaw, presented nanomechanical and nanotribological studies of ultrathin films. Prof. Rymuza's work on friction, wear, and acoustic analysis is of particular interest in chip manufacturing for increasing performance and product life.
Dr. I. Rangelow of the University of Kassel, reported on tips and piezoresistive SPM probes, advanced etching techniques, electron beam induced deposition, and micro machining to achieve extremely small and sensitive probes.
Serious Chat at Posters
Dr. I. Rangelow, Kassel
Founded in 1945, Worclaw University of Technology is now one of Europe's leading centers for technical education, with an enrollment in excess of 10,000.
Overall coordinator for the workshop was Prof. Teodor Gotszalk (l) of the Wroclaw University of Technology's nanoscience faculty. Co-hosts were Prof. Dr. Hab. Benedict Licznerski, director of the Wroclaw University of Technology Microsystem Institute, and Dr. Frank Reineke, director of Triple-O Microscopy.
Dr. F. J. Reineke (l) and Prof. D. Hab. B. Licznerski Dr. T. P. Gotszalk, Executive Coordinator of Wroclaw Workshop
Article about Wroclaw Workshop in Microscopy and Analysis